Atomic layer etching (ALE) and atomic layer deposition (ALD) represent pivotal techniques in nanofabrication, enabling control of material removal and growth at the atomic scale. By utilising ...

Atomic layer deposition (ALD) is a bottom-up nanofabrication deposition method that technically falls within the remit of chemical vapor deposition (CVD) methods; but it has become well-regarded as a ...

The fabrication of nanoscale devices increasingly relies on techniques that offer atomic‐scale precision, with Atomic Layer Deposition (ALD) and Area-Selective Deposition (ASD) at the forefront. ALD ...

Imagine being able to deposit a film of material just a few atomic layers at a time. As impossible as that sounds, atomic layer deposition (ALD) is a reality. In fact, it’s being used in an ...

Atomic layer deposition (ALD) used to be considered too slow to be of practical use in semiconductor manufacturing, but it has emerged as a critical tool for both transistor and interconnect ...

AZoMaterials spoke to Dr. James Trevey, CTO of Forge Nano, about how atomic layer deposition works, how the technology is maturing, and how it can be commercially adopted. Forge Nano was originally ...

Even if a housepainter takes extraordinary care when working on window frames, a bit of paint will still end up on the edges of the glass. But it’s no problem because the painter can use a sharp razor ...

Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...